EQUIPMENT SERIES
VERIS · Vertical photovoltaic diffusion furnace
NAURA ↗VERIS stands its diffusion tube upright. Wafers load vertically, the footprint shrinks and maintenance is done from floor level. NAURA offers it for boron and phosphorus diffusion plus annealing on high-efficiency cell lines.
NAURA aims VERIS at TOPCon, TBC and HTBC production and compares its single-tube output with horizontal furnaces. Ask for the reference furnace, recipe and run length behind that comparison.
General illustration of cell production equipment, not a photograph of this model. Ask the manufacturer for current photographs and layout drawings of the configuration offered.
START WITH YOUR PRODUCTION TASK
Compare VERIS and your horizontal option on the same loads, full cycle and accepted cell results, then check vertical handling, service access and the MES link at your own site.
SOURCE-LINKED DATA
Published specifications
Values below are published by the manufacturer, each with the date its source was checked. Ask for the figures that apply to your configuration and material in the quotation.
The manufacturer has not published a complete specification table for this entry. Request the exact offered drawing and operating limits.
01 · Manufacturer information
What changes when the tube stands upright
NAURA designs the VERIS temperature and gas flow for even sheet resistance and lists boron diffusion, phosphorus diffusion and annealing. Ask for sheet-resistance maps with the sampling plan and the cell efficiency they produced, because a controller figure only tells you how steady the heat is.
NAURA states that one VERIS tube gives 50% more output than a horizontal furnace, needs less floor space and can be serviced without climbing. Before you rely on these, get the reference horizontal model, recipe, wafers per load and full cycle time, a layout drawing with clearances, and a walk-through of routine service. NAURA also mentions remote management through MES; ask for the protocol and a live demonstration.
02 · Manufacturer information
VERIS published figures
| Item | NAURA figure | What to fix in the contract |
|---|---|---|
| Maximum temperature | 1030°C | Your process and the actual wafer load. |
| Control accuracy | ±1°C | Sensor and method; dopant spread is measured on wafers. |
| Breakage | ≤0.01% | Sample size, wafer condition and the handling steps included. |
| Pressure rise | ≤2 mbar/min | Keep the mbar unit and state the test conditions. |
| Single-tube output | 50% above horizontal equipment | The reference furnace and measured good output behind it. |
03 · PVYard procurement analysis
Check the floor, not only the recipe
Wafer movement
Agree boat capacity, transfer heights, wafer orientation and how handling damage is inspected. Ask exactly which loading steps are automated.
Service access
Get clearance drawings, part replacement routes and maintenance procedures, and ask how the no-climbing design works in practice.
Output comparison
Use the same wafers and acceptance rules for both furnaces, counting loading, heat-up, cool-down, process time and stoppages.
MES link
List the protocol, data fields, alarms, recipe permissions and offline behaviour, and require a demonstration on your project.
04 · PVYard procurement analysis
A trial plan for a vertical furnace
Set the comparison
Fix the wafer, dopant process, load and target electrical result for VERIS and the horizontal option alike.
Measure the spread
Check sheet resistance and the cell properties you care about at agreed boat positions over several runs.
Run real cycles
Track breakage, good output, footprint and service access with the automation that will actually ship.
Test the data link
Run the agreed MES reports, trigger faults and confirm the tool recovers and reports correctly.
05 · PVYard procurement analysis
Questions buyers ask about VERIS
How solid is the 50% output figure?
NAURA publishes the claim without the comparison setup. Ask for the reference furnace, load, recipe and measured good output.
Is the leak limit in Pa/min?
NAURA quotes ≤2 mbar/min for VERIS. Keep that unit when you write it into your specification.
Will it connect to our existing MES?
NAURA mentions MES-based remote management. Send your interface requirements and make a working connection part of acceptance.
TURN THIS INTO A CLEAR REQUEST
Ask about this product
Include the product-specific questions above and replace every bracket with your actual requirement. Save your edited text to your sourcing brief, then review it before submitting an enquiry. Saving a brief does not send it to a manufacturer.
Sources
Manufacturer information and our buying guidance are labelled section by section above. Each source below shows the date it was checked.
NAURA Vacuum Tech VERIS product page ↗
Source check: 2026-10-11 · Gives the VERIS processes, 1030°C and ±1°C figures, the mbar/min leak limit and the 50% output comparison, with a furnace image.
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