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EQUIPMENT DIRECTORY

Solar cell diffusion furnaces

Find machinery by production stage and the requirements of your line.

Selection considerations

Where diffusion sits in the cell line

A diffusion furnace forms the junction or doped layer that turns a textured wafer into the base of a working cell. Wafers arrive from texturing equipment and go on to the next steps of cell production: selective emitter work on laser doping tools, passivation and contact layers on deposition systems, then printing and firing on metallization equipment. On TOPCon routes, a tube tool such as NAURA's LPCVD system or its tube PECVD system often follows, so the furnace recipe and the downstream deposition recipe should be planned together by one process owner.

Vertical or horizontal: the two NAURA furnaces listed here

Both furnaces in this class come from NAURA. The VERIS vertical diffusion furnace stands its tube upright, loads wafers vertically, takes less floor space and lets technicians service it from floor level. NAURA positions it for boron and phosphorus diffusion plus annealing on high-efficiency lines. The HORIS D12 horizontal furnace is a multi-zone tube family that covers doping, oxide growth and annealing, with several dopant inlets and automatic waste collection.

The practical choice comes down to your building and your staff. A vertical tool changes how wafers travel into the tube, so ask NAURA to show the vertical handling path and the link to your MES. A horizontal tool may fit an existing line layout more easily; ask which hot steps you will actually run on it and how source handling changes between them. If you plan to move between PERC, TOPCon or other routes later, the guide on cell technology compatibility lists what to get confirmed for each route. Gas cabinets, exhaust scrubbing and cooling are a large share of site work for any furnace; the utilities and installation guide helps you list them before the layout is frozen.

Consumables and wafer transport around the tube

Furnace output depends on more than the tube. Boats, paddles and liners wear and get replaced, so price them alongside the machine. Browse process quartz parts, for example the square insert quartz boat from Hongsheng Quartz, and process ceramic parts for high-temperature fixtures. Ask the furnace maker which boat designs it has run, and get the replacement interval written next to the boat drawing.

Plan the transfer of wafers between carriers, boats and the next tool with cell material handling in mind. Breakage at the loading station counts against output just as much as a poor diffusion result does, so include loading and unloading in the trial you run before acceptance. Our notes on factory and site acceptance trials explain dividing that trial between the maker's floor and yours.

Plan the equipment scope

For solar cell diffusion furnaces, begin your enquiry with wafer size, intended diffusion step and batch arrangement. Request a configuration-specific quotation and agree on temperature control, process gases, handling interfaces and the agreed uniformity test. Each listing shows the published values and the questions to confirm.

Read equipment buying guides or prepare a sourcing brief.

2 equipment listings

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Horizontal photovoltaic diffusion furnace

The HORIS D12 is NAURA's horizontal furnace for diffusion, oxidation and annealing in solar cell lines. It runs low-pressure phosphorus or boron diffusion, atmospheric oxidation and annealing, wet oxidation and hydrogen annealing. NAURA lists 1030°C maximum, ±1°C control, ≤0.01% breakage and ≤2 mbar/min. Quote one process route and its source and waste handling.

NAURA
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Vertical photovoltaic diffusion furnace

VERIS is NAURA's vertical diffusion furnace for boron and phosphorus doping and annealing on TOPCon, TBC and HTBC cells. NAURA lists 1030°C maximum, ±1°C control, ≤0.01% breakage and ≤2 mbar/min pressure rise, and says one tube outputs 50% more than a horizontal furnace in less floor space. Ask what that comparison is based on.

NAURA
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Exact filters only match published specifications. Listings without that published value are not shown.

Selection guide

A diffusion furnace quotation needs to name the intended process step, wafer loading and batch arrangement. The equipment description should make clear what process hardware, loading automation and gas or exhaust interfaces are supplied. A furnace model alone does not define the complete process recipe.

Inputs to prepare before shortlisting

Process target
Specify the diffusion step and the output measurements your process team uses. Provide wafer format and the incoming condition relevant to the trial.
Batch and loading
Describe carriers, boat or batch arrangement and the loading interface. Ask how loading and unloading time is treated in the stated capacity.
Utilities and safeguards
Request gas, exhaust, electrical and safety-interface requirements for the offered configuration. Allocate site systems and operator training explicitly.

Make quotations comparable

Compare complete cycle definitions, batch utilization and availability assumptions. Ask for the measurement methods behind uniformity or repeatability statements. A chamber count or maximum batch load is not the same as net qualified output.

Plan the acceptance test

Use agreed wafers, loading positions and sampling locations. Record recipe identifiers and the agreed process measurement results. Confirm how abnormal cycles, maintenance and restart are documented and included in acceptance.

Avoid this comparison mistake

Ask for specifications from the same furnace process, and judge cell efficiency from measured process results.

Procurement guidance by PVYard Editorial, updated 2026-10-07. Turn the requirements into a sourcing brief →

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