EQUIPMENT SERIES
Laboratory-format PVD magnetron sputtering
ACME Optoelectronics (Dingneng) ↗A laboratory PVD magnetron sputtering system for perovskite film trials, rated at no more than 20 minutes for a 100 nm ITO layer.
Sold as a laboratory configuration with no model code. Dingneng's MW and GW catalogue entries are separate machines with figures of their own.
General illustration of cell production equipment, not a photograph of this model. Ask the manufacturer for current photographs and layout drawings of the configuration offered.
START WITH YOUR PRODUCTION TASK
Choose this tool for laboratory film work once your layer and full cycle are defined. Ask Dingneng to confirm in writing which steps the cycle includes and how uniformity is calculated. For any production plan, request the line configuration and its annual capacity as a separate offer.
SOURCE-LINKED DATA
Published specifications
Values below are published by the manufacturer, each with the date its source was checked. Ask for the figures that apply to your configuration and material in the quotation.
| Parameter | Published value | Source check |
|---|---|---|
| Laboratory substrate format | 300 × 400 mm; smaller formats described as compatible | 2026-10-11 |
| Cycle at 100 nm ITO | ≤20 minutes at 100 nm ITO; cycle boundary unspecified | 2026-10-11 |
| Within-substrate uniformity | <5%; formula and measurement map unspecified | 2026-10-11 |
| Between-substrate uniformity | <5%; sample count and run duration unspecified | 2026-10-11 |
01 · Manufacturer information
Dingneng lab sputtering figures and the terms to define
| Item | Dingneng value | Define before ordering |
|---|---|---|
| Substrate size | 300 × 400 mm; smaller sizes accepted | Fixture, usable coated area and edge margin |
| Cycle | 20 minutes or less at 100 nm ITO | Which of loading, pump-down, stabilisation and unloading count |
| Uniformity within a substrate | Below 5% | Formula, measuring points and edge margin |
| Uniformity between substrates | Below 5% | Number of samples, run length and statistics used |
02 · Manufacturer information
Where this sputtering tool sits in a perovskite line
This entry covers PVD magnetron sputtering at laboratory size. Thermal evaporation is its own family in the catalogue, so the ITO cycle speaks for sputtered ITO only. Wet-film coating, crystallisation and laser stations are separate machines as well.
Dingneng also lists MW and GW entries. To weigh this tool against a production offer, ask for that offer's substrate layout, station list, transfer sequence and production acceptance terms.
Sources: Dingneng laboratory sputtering technical tableDingneng process-machine catalogueDingneng company process scope
03 · PVYard procurement analysis
Setting up a sputtering trial with Dingneng
Describe your substrate and film
Give the substrate size, layer stack, target thickness and the electrical or optical properties the film must reach. Add the temperature or damage limits your underlying layers can take, based on your own process.
Fix the timing boundary
Mark where a cycle starts and ends, and log loading, pump-down, stabilisation and unloading on their own if useful. Run the trial with your real material and thickness, since the 20-minute figure was given for 100 nm ITO.
Fix the measurement plan
Set the thickness method, measuring points, edge margin, calibration and uniformity formula. Measure the spread between substrates over an agreed run and sample count. Two suppliers quoting below 5% can then be compared on equal terms.
Log the setup and recovery steps
Record the fixture, installed process options and recipe or control version used. Ask how the tool is safely stopped and restarted, and which checks come before substrates go back in.
04 · PVYard procurement analysis
Moving from the lab tool to production
Bigger substrates need fresh data
Uniformity, handling, utility use and full cycle time have to be shown again on the production machine. Lab results guide development; accepted output for the larger tool comes from its own trial.
A line has many stations
List incoming preparation, each film step, crystallisation, patterning, encapsulation and final inspection for your stack. Agree which stations Dingneng supplies and which stay with you before calling the order turnkey.
05 · PVYard procurement analysis
What to send with a Dingneng sputtering enquiry
Substrate and layer
Size, stack, target or source material and the thickness you need.
Metrology
The film tests you require, your uniformity definition and the sample plan.
Cycle and utilities
A request for the full timing boundary and a utility schedule for this quotation.
Acceptance and support
Trial records, installation site, commissioning scope and service terms for the contract.
06 · PVYard procurement analysis
Dingneng lab sputtering questions
How is the below-5% uniformity calculated?
The table gives no formula or sampling plan. Ask Dingneng to confirm both in writing for your trial.
Does the 20-minute cycle apply to every film?
It is stated for 100 nm ITO on this laboratory tool. Ask for a timed cycle with your own material and thickness.
Can this tool tell me GW line output?
GW output needs a production configuration and full line acceptance terms. Request those as a separate proposal.
TURN THIS INTO A CLEAR REQUEST
Ask about this product
Include the product-specific questions above and replace every bracket with your actual requirement. Save your edited text to your sourcing brief, then review it before submitting an enquiry. Saving a brief does not send it to a manufacturer.
Sources
Manufacturer information and our buying guidance are labelled section by section above. Each source below shows the date it was checked.
Dingneng laboratory sputtering technical table ↗
Source check: 2026-10-11 · Lists 300 × 400 mm and smaller substrates, 20 minutes or less at 100 nm ITO, and uniformity below 5% within and between substrates.
Dingneng process-machine catalogue ↗
Source check: 2026-10-11 · Sputtering and evaporation each appear in laboratory and production sizes.
Dingneng company process scope ↗
Source check: 2026-10-11 · Dingneng's perovskite process range and line engineering work.
Compare equipment for a related task
These entries are in the same category; check each one's specifications and configuration.