PV MANUFACTURING EQUIPMENT
Find machinery by production stage and the requirements of your line.
Deposition tools add the thin films that passivate the wafer surface, form passivating contacts or carry current to the electrodes. On the cell production route, wafers usually arrive from texturing and diffusion furnaces, sometimes after laser doping, and leave for metallization equipment. Tube tools also depend on carriers: graphite boats from process graphite parts and tubes from process quartz parts wear with every run, so price them into the running cost. Which films you need follows from your cell route; our cell technology compatibility notes help map TOPCon, HJT, back-contact or perovskite stacks to tool types.
Several tube offers cover the oxide and polysilicon layers of contact routes. The PERTOP tube PECVD solution from Yingkou Jinchen Machinery grows silicon oxide and in-situ doped amorphous silicon. The tube plasma polysilicon furnace from S.C New Energy runs tunnel oxide, intrinsic and doped polysilicon in one tube. From NAURA, the HORIS L12 LPCVD system uses a horizontal quartz tube with zoned heating, the HORIS P12 PECVD system loads graphite boats, and the HORIS TA12 ALD system adds passivation films that reach the wafer edge. Ask each maker how wraparound on the rear side or edge is handled and which cleaning step must follow, because that decides what the next station has to remove.
Transparent conductive and metal films usually come from PVD. The VORI vertical inline PVD line is modular and can coat one or both sides. Ideal Energy offers a sputtering family with large target tubes and carrier moisture control, a production PECVD family with a choice of RF frequencies, and an R&D PECVD reactor with HJT demonstration runs. For perovskite film trials, ACME Optoelectronics (Dingneng) supplies a laboratory magnetron sputtering tool. Treat laboratory and R&D tools as a step towards a production decision and list what changes between trial chamber and production chamber.
Ask how target use or carrier life is counted, how long a full maintenance stop takes and which spare parts ship with the tool. Request wafer breakage figures for loading and unloading at full load, and check how breakage, cycle time and throughput compare before contract figures are fixed. Gas, vacuum and exhaust needs are covered in utilities and installation, while trials, FAT and SAT shows where each film result should be signed off. Agree who supplies boats, quartz and targets for the trial so every offer runs with comparable consumables.
For solar cell deposition and pecvd equipment, begin your enquiry with cell architecture, target layer and substrate or wafer format. Request a configuration-specific quotation and agree on film thickness, uniformity, process sequence and cleaning or maintenance intervals. Each listing shows the published values and the questions to confirm.
NAURA's VORI is a modular vertical inline PVD line for sputtering, with optional multi-arc sources, offered for photovoltaic and other coating work. The page lists 30–1000 mm/min transport, ±5% film uniformity and target utilisation of ≥35% for planar and ≥80% for rotating targets. Quote it against your substrate, layer stack and film targets.
NAURAThe HORIS L12 is NAURA's horizontal tube LPCVD system for depositing oxide and polysilicon, including phosphorus- and boron-doped polysilicon, on TOPCon, TBC and HTBC cell lines. NAURA lists a 650°C maximum, ±1°C temperature control, wafer breakage of ≤0.01% and a pressure rise of ≤1 Pa/min. Quote it against your own layer, dopant, wafer load and quartz package.
NAURAThe NAURA HORIS P12 is a tube PECVD system for crystalline-silicon solar cells, listed at 650°C maximum with ±1°C control, ≤0.01% breakage and ≤1 Pa/min pressure rise. It uses graphite boats, multi-point heating and electrodes that can be changed hot. Quote it with your film stack, wafer and boat details.
NAURAThe NAURA HORIS TA12 is a tube ALD system for surface and edge passivation of TOPCon and TBC solar cells. NAURA lists ≤3% surface uniformity, ≤1 mm edge wrap, single- or double-wafer loading for full and half cells, and a claimed 30% cut in special-gas use. Send your film, wafer and edge targets for a quote.
NAURAIdeal Energy offers an R&D PECVD and HJT trial work at its Lingang process laboratory, which runs an HJT experimental line. The company says the R&D chamber matches its production chamber, so a recipe can move straight to volume. Agree the trial protocol first and plan a scale-up check on your production tool.
Ideal Energy (Shanghai) SunflowerIdeal Energy's PV sputtering tools use large-span, large-diameter target tubes with a stated use period of more than 30 days, and magnetic rods giving over 1300 gauss at the target surface. Zoned atmosphere control, cold traps and a closed carrier return manage gas and moisture. Send your target materials and film targets to get a configuration.
Ideal Energy (Shanghai) SunflowerIdeal Energy's PV PECVD tools deposit cell layers in large multilayer plasma chambers with a dual-vacuum design and rapid transfer under vacuum. RF can be 13.56 MHz or 40.68 MHz, and the plasma is described as stabilising quickly. Quote it with your layer stack, wafer format and film targets, and ask for the full chamber specification.
Ideal Energy (Shanghai) SunflowerDingneng's laboratory PVD magnetron sputtering system coats substrates of 300 × 400 mm, and smaller sizes fit too. The table lists a cycle of no more than 20 minutes for a 100 nm ITO film, with uniformity below 5% within and between substrates. It suits perovskite film development and pilot trials. Quote it with your stack, target material and thickness plan.
ACME Optoelectronics (Dingneng)S.C New Energy's tube plasma polysilicon deposition furnace grows tunnel oxide, intrinsic polysilicon and doped polysilicon in one process tube. The company points to controlled doping, light wraparound deposition and a non-hot-wall design. Wafer format and output are set when the furnace is configured for your line.
Shenzhen S.C New Energy Technology CorporationJinchen's PERTOP is a tube PECVD solution that deposits silicon oxide and in-situ doped amorphous silicon in one combined process, with built-in attention to dust and film uniformity. It is sold as a configured project, so the model number, tube layout and committed throughput come with Jinchen's proposal for your line.
Yingkou Jinchen Machinery Co., Ltd.Exact filters only match published specifications. Listings without that published value are not shown.
Deposition equipment must be matched to the intended layer stack and process route. Distinguish a process solution, a furnace family and an exact configured machine. A description of film preparation helps with shortlisting; the cell recipe and electrical result need a trial on your route.
Compare film measurements, uniformity definitions and sample positions on the same process route. Separate nominal batch capacity from a demonstrated process cycle. Ask which process settings, consumables and service tools are part of the offer.
Define layer measurements, locations and acceptance limits with the process owner. Use representative loaded runs and retain the recipe and instrument records. Record cleaning and maintenance conditions so that a short trial is not mistaken for sustained operation.
A PECVD or polysilicon process description does not by itself prove compatibility with every cell architecture or a resulting cell efficiency.
Procurement guidance by PVYard Editorial, updated 2026-10-07. Turn the requirements into a sourcing brief →