EQUIPMENT MODEL
HORIS TA12 · Tube ALD passivation system
NAURA ↗The HORIS TA12 deposits passivation films on crystalline-silicon cells inside a tube, covering the surface and the wafer edge. NAURA names TOPCon and TBC routes and describes a temperature and gas-field design for single or double loading.
Covers the TA12 tube ALD system for crystalline-silicon cells. Its page also mentions evaporation materials and perovskite preparation, and pairs the edge width with a second percentage; ask NAURA what both mean for your order.
General illustration of cell production equipment, not a photograph of this model. Ask the manufacturer for current photographs and layout drawings of the configuration offered.
START WITH YOUR PRODUCTION TASK
Choose the TA12 when NAURA has stated in writing the film, wafer load and edge measurement it will meet, explained the perovskite and edge wording, and trial runs reach the agreed film, cell and gas-use results.
SOURCE-LINKED DATA
Published specifications
Values below are published by the manufacturer, each with the date its source was checked. Ask for the figures that apply to your configuration and material in the quotation.
The manufacturer has not published a complete specification table for this entry. Request the exact offered drawing and operating limits.
01 · Manufacturer information
What the TA12 passivates and how it loads
NAURA positions the TA12 for surface and edge passivation in TOPCon and TBC cells. Its temperature and gas fields are designed for single or double loading of full and half cells, and surface-passivation uniformity is given as ≤3%. The page leaves out which film, load and formula that figure refers to.
The feature list also mentions evaporation materials and mainstream perovskite preparation, which sits oddly on a tube-ALD page. In the edge table, ≤1 mm appears beside a second ≤3% with no label. Ask NAURA which processes the TA12 is offered for and what that second figure measures.
Source: NAURA HORIS TA12 product page
02 · Manufacturer information
TA12 figures and the definition each needs
| Entry | NAURA states | Ask NAURA to define |
|---|---|---|
| Surface uniformity | ≤3% | Film property, formula, sample positions and load. |
| Edge wrap | Under 1 mm in the features; ≤1 mm in the table | Measuring method and whether the limit is inclusive. |
| Second edge figure | ≤3% beside the edge width | What it measures and how. |
| Special-gas use | 30% lower, as claimed | Compared tool and process, and measured consumption. |
| Loading | Single or double; full or half cells | Wafer size, thickness and carrier. |
Source: NAURA HORIS TA12 product page
03 · PVYard procurement analysis
Details to send with a TA12 enquiry
Film and wafer
Layer material, target thickness, the surface and electrical properties you need, wafer size and thickness, and incoming condition. If your route also needs a polysilicon layer for passivating contacts, that runs on NAURA's tube LPCVD system.
Edge limits
Allowed wrap width, measuring method, which wafer sides count and where samples are taken. Settle both edge entries and their limits.
Process and load
Precursor and gases, tube, carrier, loading and controls. Ask which architectures and materials NAURA has actually run on the TA12. Nitride or oxide caps on the same line run on NAURA's tube PECVD system.
Gas and site
How the gas saving will be compared at your production load, plus supply, abatement, exhaust and maintenance needs for your chemistry.
Source: NAURA HORIS TA12 product page
04 · PVYard procurement analysis
Run surface and edge trials separately
Settle the wording
Agree the ALD film and process, and get written answers on the evaporation, perovskite and edge entries.
Coat a full load
Measure surface uniformity by the agreed method and positions, recording wafer and process conditions.
Check edges and cells
Measure wrap against the agreed boundary and test the cell or surface properties that matter to you.
Prove production running
Record accepted output and material use. Have NAURA show interruption handling, purging, reject handling and maintenance with your chemistry.
Source: NAURA HORIS TA12 product page
05 · PVYard procurement analysis
HORIS TA12 buyer questions
Is ≤3% enough to specify my film?
It is one uniformity figure. Agree the film, property, calculation and load it applies to.
Can the TA12 run perovskite evaporation?
The page mentions it without a matching process specification. Ask NAURA to answer in writing.
How firm is the 30% gas saving?
NAURA gives no baseline. Ask for the comparison tool, process and measured consumption.
Source: NAURA HORIS TA12 product page
TURN THIS INTO A CLEAR REQUEST
Ask about this product
Include the product-specific questions above and replace every bracket with your actual requirement. Save your edited text to your sourcing brief, then review it before submitting an enquiry. Saving a brief does not send it to a manufacturer.
Sources
Manufacturer information and our buying guidance are labelled section by section above. Each source below shows the date it was checked.
NAURA HORIS TA12 product page ↗
Source check: 2026-10-11 · Passivation features with uniformity, edge-wrap and gas-use figures, and a product illustration.
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