Solar cell manufacturing equipment

NAURA's VORI is a modular vertical inline PVD line for sputtering, with optional multi-arc sources, offered for photovoltaic and other coating work. The page lists 30–1000 mm/min transport, ±5% film uniformity and target utilisation of ≥35% for planar and ≥80% for rotating targets. Quote it against your substrate, layer stack and film targets.

The HORIS D12 is NAURA's horizontal furnace for diffusion, oxidation and annealing in solar cell lines. It runs low-pressure phosphorus or boron diffusion, atmospheric oxidation and annealing, wet oxidation and hydrogen annealing. NAURA lists 1030°C maximum, ±1°C control, ≤0.01% breakage and ≤2 mbar/min. Quote one process route and its source and waste handling.

VERIS is NAURA's vertical diffusion furnace for boron and phosphorus doping and annealing on TOPCon, TBC and HTBC cells. NAURA lists 1030°C maximum, ±1°C control, ≤0.01% breakage and ≤2 mbar/min pressure rise, and says one tube outputs 50% more than a horizontal furnace in less floor space. Ask what that comparison is based on.

The HORIS L12 is NAURA's horizontal tube LPCVD system for depositing oxide and polysilicon, including phosphorus- and boron-doped polysilicon, on TOPCon, TBC and HTBC cell lines. NAURA lists a 650°C maximum, ±1°C temperature control, wafer breakage of ≤0.01% and a pressure rise of ≤1 Pa/min. Quote it against your own layer, dopant, wafer load and quartz package.

The NAURA HORIS P12 is a tube PECVD system for crystalline-silicon solar cells, listed at 650°C maximum with ±1°C control, ≤0.01% breakage and ≤1 Pa/min pressure rise. It uses graphite boats, multi-point heating and electrodes that can be changed hot. Quote it with your film stack, wafer and boat details.

The NAURA HORIS TA12 is a tube ALD system for surface and edge passivation of TOPCon and TBC solar cells. NAURA lists ≤3% surface uniformity, ≤1 mm edge wrap, single- or double-wafer loading for full and half cells, and a claimed 30% cut in special-gas use. Send your film, wafer and edge targets for a quote.

Ideal Energy offers an R&D PECVD and HJT trial work at its Lingang process laboratory, which runs an HJT experimental line. The company says the R&D chamber matches its production chamber, so a recipe can move straight to volume. Agree the trial protocol first and plan a scale-up check on your production tool.

Ideal Energy's PV wet-process line handles 182R–210R wafers with a customisable number, layout and function of tanks. Acid and alkaline regions are hard-separated, robots move wafers between them, circulation runs on a variable-frequency drive and alkaline exhaust ducts have hot-water cleaning. Quote it with your chemistry, wafer drawing and surface target.

Ideal Energy's PV sputtering tools use large-span, large-diameter target tubes with a stated use period of more than 30 days, and magnetic rods giving over 1300 gauss at the target surface. Zoned atmosphere control, cold traps and a closed carrier return manage gas and moisture. Send your target materials and film targets to get a configuration.

Ideal Energy's PV PECVD tools deposit cell layers in large multilayer plasma chambers with a dual-vacuum design and rapid transfer under vacuum. RF can be 13.56 MHz or 40.68 MHz, and the plasma is described as stabilising quickly. Quote it with your layer stack, wafer format and film targets, and ask for the full chamber specification.

HORAD's cell feeding system moves cell baskets between cell handling and the laser cutter or stringer, then sends empty baskets back on a lower conveyor. Each turnover jig holds 300 cells, and HORAD says one layout with eight manual loading positions feeds stringers for four module lines. The system is labelled for BC, TOPCon and HJT cells.

Silver powder for PV conductive paste, offered in flake, spherical, nano and single-crystal grades. Jingxin supplies the conductive ingredient and you or your paste supplier formulate it. Choose by electrode and cell type, then request the grade sheet, a lot certificate and samples for a print-and-fire trial.